by M . R . Oliver (Editor)
This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. The leading edge issues of damascene and new dielectrics as well as slurryless technology are discussed.
Format: Hardcover
Pages: 425
Publisher: Springer
Published: 26 Jan 2004
ISBN 10: 3540431810
ISBN 13: 9783540431817