by Bei Yu (Author), David Z. Pan (Author)
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).
Format: Hardcover
Pages: 178
Edition: 1st ed. 2016
Publisher: Springer
Published: 15 Nov 2015
ISBN 10: 3319203843
ISBN 13: 9783319203843