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Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology

Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology

by Christopher Lyle Borst (Author), Ronald J. Gutmann (Author), William N. Gill (Author)

$225.35

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20+ in stock

More Information

Format: Illustrated
 Pages: 252
 Edition: 2002
 Publisher: Springer
Published: 30 Sep 2002
ISBN 10: 1402071930
ISBN 13: 9781402071935