Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons

by Arthur Sherman (Author), David Cameron (Author), TommiKääriäinen (Author), Marja - Leena K ä ; ä ;ri ä ;inen (Author)

• New

  Hardcover
  2013

  $219.09

  Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.