Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons

Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons

by Arthur Sherman (Author), David Cameron (Author), Marja - Leena K ä ; ä ;ri ä ;inen (Author), TommiKääriäinen (Author)

Synopsis

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.

$219.02

Quantity

20+ in stock

More Information

Format: Hardcover
Pages: 272
Edition: 2nd Edition
Publisher: John Wiley & Sons
Published: 28 Jun 2013

ISBN 10: 1118062779
ISBN 13: 9781118062777