Computational Lithography (Wiley Series in Pure and Applied Optics)

by XuMa (Author), Gonzalo R . Arce (Author)

New
Hardcover
2010
$125.09

This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.

Synopsis

This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.

$125.09

Quantity

20+ in stock

More Information

Format: Hardcover
Pages: 226
Publisher: Wiley-Blackwell
Published: 06 Aug 2010
ISBN 10: 047059697X
ISBN 13: 9780470596975

Computational Lithography (Wiley Series in Pure and Applied Optics)

New

$125.09

Synopsis

$125.09

More Information