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Developments in Surface Contamination and Cleaning: Volume 1: Fundamentals and Applied Aspects

Developments in Surface Contamination and Cleaning: Volume 1: Fundamentals and Applied Aspects

by Kashmiri L. Mittal Dr. (Editor), Rajiv Kohli (Editor)

  • New

    Hardcover 2015

    $367.46
Synopsis

Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation. Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination. In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants. The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography.

$367.46

Quantity

20+ in stock

More Information

Format: Hardcover
 Pages: 894
 Edition: 2
 Publisher: William Andrew
Published: 09 Nov 2015
ISBN 10: 0323299601
ISBN 13: 9780323299602
Book Overview: This book provides a state-of-the-art reference for all major areas in surface contamination and cleaning for industries ranging from semiconductor fabrication to space exploration, presenting an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation.

Media Reviews
Although most valuable as background reading rather than day-to-day troubleshooting, this book is highly recommended. It will stimulate readers to review cleaning practices in their own organisations and provide ideas as to how these might be improved. --Galvanotechnik, Developments in Surface Contamination and Cleaning, Vol. 1, Second Edition
Author Bio
NASA Johnson Space Center -Rajiv Kohli is a leading expert in contaminant particle behaviour, surface cleaning and contamination control. At the NASA Johnson Space Center he has primary responsibility for contamination control related to spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program (designed to meet the United States Vision for Space Exploration). He helped to develop solvent-based cleaning applications for the nuclear industry and an innovative microabrasive system for a wide variety of applications in the commercial sector. He co-authored Commercial Utilization of Space: An International Comparison of Framework Conditions, and has published over 200 technical papers. His other specialisms include precision cleaning, solution and surface chemistry, advance materials and chemical thermodynamics. In 2005, Dr. Kohli received the Public Service Medal, one of NASA's highest awards, for contributions to the Space Shuttle Return to Flight project. Editor: `Reviews of Adhesion and Adhesives'was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of 85 books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003.