Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications: Vol. 23 (Thin Films): Volume 23

Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications: Vol. 23 (Thin Films): Volume 23

by John L. Vossen (Series Editor), Maurice H. Francombe (Series Editor)

Synopsis

The progress in device technologies are surveyed in this volume. Included are Si/ (Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, and III-V quantum-well detector structures operated in the heterodyne mode.

$258.75

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20+ in stock

More Information

Format: Hardcover
Pages: 311
Publisher: Academic Press
Published: 14 Nov 1997

ISBN 10: 0125330235
ISBN 13: 9780125330237