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Communications Engineering Desk Reference Communications Engineering Desk Reference by Erik Dahlman,Stefan Parkvall,Johan Skold,Per Beming,Alan C. Bovik Professor,Bruce A. Fette Dr.,Keith Jack,Farid Dowla,Casimer DeCusatis Dr.,Ed da Silva,Luis M. Correia,Philip A Chou,Mihaela van der Schaar,Ronald Kitchen I Eng,Daniel M. Dobkin,Dan Bensky,Juanita Ellis,Charles Pursell,Joy Rahman,Leonidas Guibas,Feng Zhao

Communications Engineering Desk Reference

by Erik Dahlman,Stefan Parkvall,Johan Skold,Per Beming,Alan C. Bovik Professor,Bruce A. Fette Dr.,Keith Jack,Farid Dowla,Casimer DeCusatis Dr.,Ed da Silva,Luis M. Correia,Philip A Chou,Mihaela van der Schaar,Ronald Kitchen I Eng,Daniel M. Dobkin,Dan Bensky,Juanita Ellis,Charles Pursell,Joy Rahman,Leonidas Guibas,Feng Zhao


ISBN 13: 9780123746481

Format: Hardcover (568 pages)
Publisher: Academic Press
Published: 16 Feb 2009

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Principles of Chemical Vapor Deposition: What's Going on Inside the Reactor Principles of Chemical Vapor Deposition: What's Going on Inside the Reactor by Daniel M. Dobkin,Micheal K. Zuraw

Principles of Chemical Vapor Deposition: What's Going on Inside the Reactor

by Daniel M. Dobkin,Micheal K. Zuraw


ISBN 13: 9789048162772

Format: Paperback (288 pages)
Publisher: Springer Netherlands
Published: 28 Dec 2009

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